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Re: [PATCH] Option to subtract soldermask from silkscreen in gerber output


Le 12/12/2010 12:04, Marco Mattila a écrit :

Using OR instead of COPY in blitting does not produce equivalent
resuilts. Now the appearance of one layer depends on what was drawn
"below" it.


On Sun, Dec 12, 2010 at 4:33 AM, Dick Hollenbeck<dick@xxxxxxxxxxx>  wrote:

However, I found some significant speed ups:

1) not using GR_OR mode when erasing the background of a negative layer.

2) not using the mask in the Blit() function but rather use wxOR there, which seems to
be signicantly faster for some reason.

The two changes together are extremely snappy.

Please test to make sure this code is equivalent with respect to display results.

I now fixed issue when compiling with USE_WX_ZOOM defined,
i.e. when the device context is responsible to calculate zoom and draw offset.
(blit function seems work only when user scale = 1 and no offset).

About OR and COPY, each image (gerber layer) is drawn into its memory DC using COPY, so each image should be OK.

Combining different images using OR is better than COPY, because one can see all images (transparency effect),
like all layers in Pcbnew, and do not change Gerber images.

This code need to be tested now under MacOSX.

Jean-Pierre CHARRAS

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